Agenda

CANCELLED: ALD-ALE 2020 After much deliberation in the wake of rapidly changing and unprecedented circumstances surrounding the 2019 Novel Coronavirus (COVID-19), the AVS has made the extremely difficult decision to cancel the AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020) scheduled for June 28-July 1, 2020 in Ghent, Belgium.
Big Science Business Forum 2020, Granada BSBF 2020 is a business oriented congress which congregates all the European Research Infrastructures, focused on technology and with the aim to be the main meeting point between Research Infrastructures and industry.
BSBF2020 will bring together, for the second time, the largest and most cutting edge research infrastructures in Europe and the world: CERN, EMBL, ESA, ESO, ESRF, ESS, European XFEL, F4E, ILL and SKA as well as other guest and affiliated research organisations.
The forum will offer your business the chance to:

  • Learn about business opportunities in the coming years, within a wide range of business areas and technologies

  • Meet representatives from Europe's Big Science organisations and their key suppliers.

  • Network and establish long lasting partnerships via business-to-business meetings (B2B), business-to-customer meetings (B2C) and in the open exhibition area.

  • Get insight into procurement rules, IPR, technology transfer and how businesses can interplay with the Big Science market.

  • Boost your SME visibility in the Big Science Market

  • Expand your business exploring new technology transfer opportunities

AVS 67th International Symposium & Exhibition Colorado Convention Center, Denver, CO
Contact: Yvonne Towse, e-mail:yvonne@avs.org

The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.
 Nationaal Symposium Contamination Control Het symposium in Congrescentrum ‘s-Hertogenbosch heeft een middagvullend programma met parallelle sessies. Daarnaast is er de mogelijkheid tot het deelnemen aan of bezoeken van de vakbeurs. Het programma wordt in april bekend gemaakt. Vanaf dat moment kan je je inschrijven als symposiumdeelnemer.
ALD@NL day Please reserve the date!
The aim of this national event is to bring researchers, technologists and other people interested in ALD together to learn about the latest developments in research, development and manufacturing.
The day will feature presentations and also provide ample opportunity for networking.
Please preregister to receive updates on the event: www.AtomicLimits.com/ALD-NL-day

NEVAC blad

Het NEVAC blad is het orgaan van de NEVAC waarmee zij haar leden op de hoogte houdt van de ontwikkelingen op het gebied van vacuümtechniek en de toepassing van vacuüm. Nieuwe vacuümconstructies, nieuwe onderdelen, pompen, toepassingen, etc., worden belicht. Toepassingen van vacuümtechniek in onderzoek aan oppervlakken en dunne films komen ruim aan bod. Leden krijgen het NEVAC blad automatisch toegestuurd. Het blad verschijnt driemaal per jaar en artikelen zijn hoofdzakelijk in het Nederlands. Ieder jaar wordt de NEVAC-prijs uitgereikt voor het beste artikel geschreven door promovendi en studenten. Sinds het voorjaar van 1998 is er deze NEVAC-website voor actuele informatie op het gebied van vacuüm.

Laatste nummer NEVAC blad, juni 2020

Uit de inhoud:

* Map of ALD@NL
* Editorial: Atomic layer deposition in the Netherlands Erwin Kessels & Bart Macco
* ALD – a truly enabling nanotechnology; And how the Netherlands contributed to its wide spread application Erwin Kessels
* Plasma-assisted Atomic Layer Deposition; High-volume manufacturing and new opportunities in research Harm Knoops
* Hot-Wire assisted ALD; Another example of radical enhanced atomic layer deposition Alexey Y. Kovalgin, Antonius A.I. Aarnink, Mengdi Yang
* ALD on particles; Scalable production of nanostructured materials Ruud van Ommen
* Atomic Layer Deposition for crystalline silicon solar cells; Innovate at the nanoscale, deploy at the gigawatt scale Bart Macco
* Interface engineering by ALD in organo-metal halide perovskite solar cells; Reflections on the state-of-the art and perspectives Adriana Creatore
* Spatial Atomic Layer Deposition for large-area and flexible electronics Paul Poodt
* Area-selective atomic layer deposition for bottom-up fabrication of nanoelectronics Adrie Mackus, Marc Merkx, Jun Li
* Tailoring the properties of 2D transition metal dichalcogenides by ALD Ageeth Bol, Shashank Balasubramanyam, Saravana Basuvalingam, Jeff Schulpen, Vincent Vandalon
* Etching with atomic-level precision; The emerging field of atomic layer etching Adrie Mackus, Tahsin Faraz, Nick Chittock
* ALD@NL Day










Redactie NEVAC blad

Claud Biemans (eindredacteur)
Ad Ettema
Hans van Eck (hoofdredacteur)
Rients de Groot
Karine van der Werf
redactie@nevac.nl

Advertenties, ledenadministratie, abonnementen
Ad Ettema
Delftechpark 26
2628 XH Delft The Netherlands
T: +31 15 2600406 F: +31 15 2600405
penningmeester@nevac.nl

Abonnementen (voor niet-leden)
Binnenland € 100,- per jaar
Buitenland € 150,- per jaar

Grafische vormgeving
Claud Biemans
www.frontlinie.nl

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