Agenda

ALD-ALE 2021 The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2021 Workshop (ALE 2021), so that attendees can interact freely. The conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the JW Marriott Tampa Water Street in Tampa, Florida.
VCCN Minisymposium Product Cleanliness High Tech Campus Eindhoven

Suppliers are increasingly being asked to deliver clean products to OEM companies (Original Equipment Manufacturer). Because there is a need for a definition of how clean the product must be, VCCN set up the Nano, Micro, Product Cleanliness project group in 2017. This working group consists of OEM companies, suppliers and knowledge companies. Soon after the working group started, there was a need to develop a guideline so that everyone speaks the same language with regard to product cleanliness. With the help of OEM companies, who set requirements for the cleanliness of the product, they are energetically working on drawing up VCCN Guideline 12.

In this mini-symposium, experts present the progress of VCCN Guideline 12 and provide substantive contributions. The speakers will be:

Koos Agricola, project manager VCCN Guideline 12
Philip van Beek, Contamination Q&A, VCCN
Max van de Berg, Festo
Rients de Groot, Thermo Fisher Scientific
Paul Krüsemann, Eurofins Material Science Netherlands B.V.
Freek Molkenboer, TNO
Olof Teulings, NTS Mechatronics
Dirk Trienekens, ASML Netherlands B.V.

The chairman of the day is Philip van Beek, co-initiator of the Nano, Micro, Product Cleanliness project group.
AVS 67th International Symposium & Exhibition The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

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NEVAC blad

Het NEVAC blad is het orgaan van de NEVAC waarmee zij haar leden op de hoogte houdt van de ontwikkelingen op het gebied van vacuümtechniek en de toepassing van vacuüm. Nieuwe vacuümconstructies, nieuwe onderdelen, pompen, toepassingen, etc., worden belicht. Toepassingen van vacuümtechniek in onderzoek aan oppervlakken en dunne films komen ruim aan bod. Leden krijgen het NEVAC blad automatisch toegestuurd. Het blad verschijnt driemaal per jaar en artikelen zijn hoofdzakelijk in het Nederlands. Ieder jaar wordt de NEVAC-prijs uitgereikt voor het beste artikel geschreven door promovendi en studenten. Sinds het voorjaar van 1998 is er deze NEVAC-website voor actuele informatie op het gebied van vacuüm.

Laatste nummer NEVAC blad, april 2021

Uit de inhoud:
* Applied Vacuum Technology training for PhD students and postdocs in 2021
* Van het bestuur: Een virtueel begin: NEVAC-dag en ALV Sense Jan van der Molen
* (PhD) Student? NEVAC beloont je verhaal met 1000 of 250 euro!
* Gecontroleerde groei van metalen éénkristallen via elektromagnetische levitatie J.P. Witteveen, A. van Houselt, R. van Gastel, H.J.W. Zandvliet
* Reactie: Berglandschap in gasontladingselektronenkanon Bert Suurmeijer
* VCCN-Richtlijn 12 Olof Teulings
* Program online NEVAC Symposium 2021, 18 May
* Exploring the physics and chemistry of nanolithography Roland Bliem, Jan Verhoeven, and Joost Frenken
* Notulen NEVAC ALV 2019
* Financieel jaarverslag 2019 en 2020
* Verslag kascommissie 2020 en 2021
* Wie komt het NEVAC-bestuur versterken?
* Jaarverslag Commissie Opleidingen
* Nieuw product: Leybold ECODRY 25 en 35 plus
* Stel je voor: Berend Munneke



Redactie NEVAC blad

Claud Biemans (eindredacteur)
Ad Ettema
Hans van Eck (hoofdredacteur)
Rients de Groot
Karine van der Werf
redactie@nevac.nl

Advertenties, ledenadministratie, abonnementen
Ad Ettema
Delftechpark 26
2628 XH Delft The Netherlands
T: +31 15 2600406 F: +31 15 2600405
penningmeester@nevac.nl

Abonnementen (voor niet-leden)
Binnenland € 100,- per jaar
Buitenland € 150,- per jaar

Grafische vormgeving
Claud Biemans
www.frontlinie.nl

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