Agenda
Aanvang 19.30 uur, online. Meld u aan voor de vergadering via dit formulier.
Conceptagenda NEVAC ALV 2021
1. Opening
2. Vaststellen agenda
3. Bestuursmutaties
4. Mededelingen
5. Conceptnotulen van de ALV 17 mei 2019 op de Radboud Universiteit Nijmegen
6. Jaarverslagen van de commissies
• Commissie Opleidingen
• Excursiecommissie
• Redactie NEVAC blad / Website
7. Financieel overzicht 2019 en 2020 en begroting 2021
8. Verslag van de Kascommissie
• Decharge bestuur
• Benoeming nieuwe kascommissie
9. Rondvraag
10. Sluiting
It gives us great pride to announce that this year, ARCNL will organize the NEVAC Symposium on May 18, 2021 fully online. Please, check out arcnl.nl/nevac for this year’s program and for your registration for attending the NEVAC Symposium 2021. We hope to welcome all of you for that great day. In addition to a number of exciting lectures, we offer an online tour of ARCNL and two sessions with so-called bullet presentations, as an alternative for the traditional poster session.
Bullet presentations are compact, 3-minute presentations, without questions and answers. You can submit your title and abstract by filling out that information on the registration form. The deadline for these special presentations is Friday, 23 April. We will get in touch with you soon after that to let you know whether your contribution was selected, after which we will provide you with instructions for the pre-recording of these mini-presentations.
This year’s organizers:
Prof. Joost Frenken, Dr. Jan Verhoeven, Dr. Roland Bliem
This year, the Symposium will not be combined with the annual General Assembly of the Members of the NEVAC Society. This meeting will take place online Wednesday 12 May, 19.30 hr. Register for the General Assembly on this page.
Registration
Participation in this year’s NEVAC Symposium is free of charge, even if you’re not a NEVAC member yet (membership registration page). In order to get a ZOOM link to our meeting, you first have to register at arcnl.nl/nevac.
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High Tech Campus EindhovenSuppliers are increasingly being asked to deliver clean products to OEM companies (Original Equipment Manufacturer). Because there is a need for a definition of how clean the product must be, VCCN set up the Nano, Micro, Product Cleanliness project group in 2017. This working group consists of OEM companies, suppliers and knowledge companies. Soon after the working group started, there was a need to develop a guideline so that everyone speaks the same language with regard to product cleanliness. With the help of OEM companies, who set requirements for the cleanliness of the product, they are energetically working on drawing up VCCN Guideline 12.
In this mini-symposium, experts present the progress of VCCN Guideline 12 and provide substantive contributions. The speakers will be:
Koos Agricola, project manager VCCN Guideline 12
Philip van Beek, Contamination Q&A, VCCN
Max van de Berg, Festo
Rients de Groot, Thermo Fisher Scientific
Paul Krüsemann, Eurofins Material Science Netherlands B.V.
Freek Molkenboer, TNO
Olof Teulings, NTS Mechatronics
Dirk Trienekens, ASML Netherlands B.V.
The chairman of the day is Philip van Beek, co-initiator of the Nano, Micro, Product Cleanliness project group.
The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2021 Workshop (ALE 2021), so that attendees can interact freely. The conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the JW Marriott Tampa Water Street in Tampa, Florida.
More information: www.vacuumnanoelectronics.org/
meer agenda
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Fee
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