Agenda
FYSICA is the annual physics conference of the Netherlands' Physical Society (NNV). Each year the NNV organises FYSICA in cooperation with a Dutch university, in 2020 with Universiteit Twente.
Postponed due to COVID-19:The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.
Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem
Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam
Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)
10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture
11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session
13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?
13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation
15.00 Tea break
15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale
16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END
Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.
More information will follow about the date.
Tuning properties of advanced energy materials using modern theoretical and experimental methods24 – 28 May, 2020
Valencia, Spain
Het symposium in Congrescentrum ‘s-Hertogenbosch heeft een middagvullend programma met parallelle sessies. Daarnaast is er de mogelijkheid tot het deelnemen aan of bezoeken van de vakbeurs. Het programma wordt in april bekend gemaakt. Vanaf dat moment kan je je inschrijven als symposiumdeelnemer.
meer agenda
Author guidelines
HeadlineKeep it short. Use a subtitle if necessary.
Authors
First name and family name of all authors, followed by address and email.
Introduction
Maximum 150 words, describing the content of the paper.
Main text
Maximum 2000 words, including introduction. Use paragraph headers after more or less every 300 words. End with conclusions.
Symbols
Use SI units. Explain deviating units. Explain symbols. Use italic typesetting for symbols.
Use boxes
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File formats
Text as .doc of .docx files. It is always good to add a pdf file of the complete document.
Images
Always send images as separate files. Formats: jpg, eps, ai, psd, tif. Resolution: 300 dpi at printable size or bigger. Captions up to 50 words. If you want to use an image with extended explanation: use a box.
Fee
Master students and PhD students will receive € 250,- for published articles.
Send text and images to redactie@nevac.nl