Agenda

Spatial ALD day, TU Eindhoven On June 9th 2022, we will organize the spatial ALD day at the Eindhoven University of Technology. This full-day event will cover various aspects of spatial ALD, including presentations by spatial ALD companies in the Netherlands, as well as overview and in-depth presentations about (spatial) ALD and its applications. This day is inspired by and part of our spatial ALD research project, funded by NWO.
You can register on the website!
95th IUVSTA Workshop “Plasmonic Thin Films: Theory, Synthesis and Applications” 95th IUVSTA Workshop
“Plasmonic Thin Films: Theory, Synthesis and Applications”
City of Guimarães, Portugal
Website
AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) Location: Ghent, Belgium

The AVS 22nd International Conference on Atomic Layer Deposition (ALD 2022) featuring the 9th International Atomic Layer Etching Workshop (ALE 2022) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2022 Workshop (ALE 2022), so that attendees can interact freely. The conference will take place Sunday, June 26 - Wednesday, June 29, 2022, at the International Convention Center in Ghent, Belgium.

As in past conferences, the meeting will be preceded (Sunday, June 26) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 26-29) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.
48th European Conference on Plasma Physics The 48th European Conference on Plasma Physics (2022) will be held as an online meeting from June 27 to July 1 2022. This annual conference covers the wide field of plasma physics including magnetic confinement fusion, beam plasma and inertial fusion, low temperature plasmas, and basic, space and astrophysical plasmas.
Applied Vacuum Technology training The Applied Vacuum Technology training will be organised in Delft for Master students, PhD students and post-doctoral researchers in Physics and Chemistry. The training is organised under auspices of the NEVAC (Netherlands Vacuum Society).
More information and registration

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Foto's NEVAC-dag 2022: 60 jaar NEVAC

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Programma NEVAC-dag 2022: 60 jaar NEVAC

13 april 2022
Rijksmuseum Boerhaave, Lange Sint Agnietenstraat 10, 2312 WC Leiden


Dagprogramma
9.00 Opbouw stands bedrijvenmarkt
9.45 Ontvangst en koffie
10.15 Introductie door Sense Jan van der Molen, voorzitter NEVAC
10.30 Abel Streefland (TU Delft), Jaap Kistemaker en uraniumverrijking in Nederland
11.10 Gesa Welker (TU Delft) Vacuüm op de koudste plekken ter wereld
11.50 NEVAC prijswinnaar 2022: Jesse Koenders (DIFFER) Actief schild tegen de hitte van een fusiereactor

12.20 Lunch en rondleiding door Rijksmuseum Boerhaave (aanwezigen kunnen het museum de hele dag ook zelfstandig bezoeken)
12.30 NEVAC-ALV en bedrijvenmarkt

14.00 Freek Molkenboer (TNO) CSI, de nieuwe Space kalibratiefaciliteit bij TNO
14.40 Johannes Jobst (DEMCON Advanced Mechatronics B.V) SMART: accelerator-based, high-volume production of medical isotopes
15.20 Demonstraties door bedrijven van hun producten
16.00 Borrel en rondleiding door Rijksmuseum Boerhaave
17.15 Buffet (voor degenen die zich hiervoor tijdig hebben aangemeld en na betaling)

Avondprogramma
18.45 Spetterende wetenschapsshow door Stichting Rino en inloop breder publiek
19.30 Avondlezing: Joost Frenken (ARCNL, VU en UvA): Veel druk(te) om niets
Link naar deze publiekslezing

Kosten deelname
NEVAC lid gratis
NEVAC-bedrijfslid gratis
Niet-NEVAC-lid € 20 inclusief lidmaatschap
Niet-NEVAC-lid, B.Sc./M.Sc. student € 5 inclusief lidmaatschap
Stand NEVAC-bedrijfsleden € 350
Andere standhouders € 500 inclusief bedrijfslidmaatschap
Dinerbuffet € 27,50

Organisatie
Guido Stam, Sense Jan van der Molen, Gertjan van Baarle en Fred Schenkel

Informatie: Guido Stam, WGstam@Physics.LeidenUniv.nl
Informatie standhouders: Pieter Heidema, pieter.heidema@vacuubrand.com
Download de pdf van NEVAC blad 2022-1 met daarin het complete programma en samenvattingen van de lezingen


NEVAC Symposium 2021, ARCNL, online

It gives us great pride to announce that this year, ARCNL will organize the NEVAC Symposium on May 18, 2021 fully online.

Please, check out arcnl.nl/nevac for this year’s program and for your registration for attending the NEVAC Symposium 2021. We hope to welcome all of you for that great day. In addition to a number of exciting lectures, we offer an online tour of ARCNL and two sessions with so-called bullet presentations, as an alternative for the traditional poster session.

Bullet presentations are compact, 3-minute presentations, without questions and answers. You can submit your title and abstract by filling out that information on the registration form. The deadline for these special presentations is Friday, 23 April. We will get in touch with you soon after that to let you know whether your contribution was selected, after which we will provide you with instructions for the pre-recording of these mini-presentations.

This year’s organizers:
Prof. Joost Frenken, Dr. Jan Verhoeven, Dr. Roland Bliem

This year, the Symposium will not be combined with the annual General Assembly of the Members of the NEVAC Society. This meeting will take place online Wednesday 12 May, 19.30 hr. Register for the General Assembly on this page.

Registration
Participation in this year’s NEVAC Symposium is free of charge, even if you’re not a NEVAC member yet (membership registration page). In order to get a ZOOM link to our meeting, you first have to register at arcnl.nl/nevac.

download flyer

Postponed: NEVAC day 2020, ARCNL Amsterdam

Postponed due to COVID-19
More information will follow

The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.

Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem

Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam

Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)

10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture

11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session

13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?

13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation

15.00 Tea break

15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale

16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END

Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.

More information will follow



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