Agenda
Ook dit jaar een kijkje in de keuken bij de wetenschap? Bij ARCNL Open Dag, de online editie kan het. Meld je aan, ontvang de ZOOM-link, en doe mee: volg een minilezing over computer- en geheugenchips van ASML en het onderzoek van ARCNL, en bekijk de live (online) laboratoriumtours. Of ga samen met de (klein-) kinderen aan de slag om een kleurensplitser te maken.
Featuring Three FREE Live Sessions on Emerging Topics Related to Materials, Processing & InterfacesWith the unfortunate cancellation of the AVS 67th International Symposium & Exhibition, AVS is pleased to present the AVS 67 Virtual Showcase to be held October 27-29, 2020, 10:00 am-1:00 pm. (EDT). Like the AVS International Symposium, this Virtual Showcase will also cover a range of emerging topics related to materials, processing, and interfaces in both the research and manufacturing communities. The Virtual Showcase will consist of three live sessions filled with invited speakers and award talks, live Q&A, other highlights, and special events.
Although you will be required to register to participate in this event, AVS is providing the Virtual Showcase FREE of charge in order to support our community, promote collaboration, networking, engagement, and disseminate scientific content.
Het symposium in Congrescentrum ‘s-Hertogenbosch heeft een middagvullend programma met parallelle sessies. Daarnaast is er de mogelijkheid tot het deelnemen aan of bezoeken van de vakbeurs. Het programma wordt in april bekend gemaakt. Vanaf dat moment kan je je inschrijven als symposiumdeelnemer.
Please reserve the date!The aim of this national event is to bring researchers, technologists and other people interested in ALD together to learn about the latest developments in research, development and manufacturing.
The day will feature presentations and also provide ample opportunity for networking.
Please preregister to receive updates on the event: www.AtomicLimits.com/ALD-NL-day
BSBF 2021 is a business oriented congress which congregates all the European Research Infrastructures, focused on technology and with the aim to be the main meeting point between Research Infrastructures and industry.This will be the second edition of the event after the success of the previous edition in Copenhagen, where more than 1,000 participants from more than 500 organisations and 29 countries gathered together to discuss the future prospects of the Big Science Market.
Postponed: NEVAC day 2020, ARCNL Amsterdam
Postponed due to COVID-19More information will follow
The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.
Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem
Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam
Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)
10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture
11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session
13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?
13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation
15.00 Tea break
15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale
16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END
Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.
More information will follow
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