Agenda
The aim of the IUVSTA workshop on Advances in the characterization of surface engineering structures, coatings, and thin films is to address significant advances in characterization techniques for nanostructure, composition and properties of surface engineering structures, coatings and thin films within the past decade. Invited talks given by well recognized experts will cover mainly, but not only, (synchrotron) X-ray diffraction based techniques, scanning and transmission electron microscopy, atom probe tomography, micro-mechanical testing and in-situ/in-operando and temperature variable setups. The necessity to use a combination of advanced characterization techniques to fully understand composition-structure-properties relationships will be highlighted.
Event hosted by the NOVA Optical-Infrared group, at ASTRON, Netherlands Institute for Radio Astronomy, in Dwingeloo. Check the agenda and the Nieuws section on this website.
Oregon Convention Center, Portland OR, United StatesThe AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.
De vakbeurs voor de gehele precisietechnologie waardeketen wordt in 2023 georganiseerd in de Brabanthallen, 's-Hertogenbosch.
Helsinki, FinlandThe AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2024 Workshop (ALE 2024), so that attendees can interact freely.
meer agenda
NEVAC-dag 2023, vrijdag 12 mei bij ASML
De NEVAC-dag 2023 vindt plaats op vrijdag 12 mei 2023 bij ASML in Veldhoven. Organisatie: Kees Feenstra.Aanmelding
De inschrijving is gesloten. Zonder inschrijving mag je dit jaar niet deelnemen aan de NEVAC-dag.
Programma
8:45 Opbouw stands bedrijvenmarkt
9:30 Ontvangst met koffie
10:00 Opening door vicevoorzitter Freek Molkenboer
10:10 Magnetische wisselwerking tussen enkele atomen Lukas Veldman (TUD)
10:50 Uitgassingsmetingen voor EUV-lithografie Ton van der Net (ASML)
11:30 Uitreiking NEVAC-prijs en presentatie prijswinnaar Roel Gerlings
12:00 Lunch
13:00 Ledenvergadering, bedrijvenmarkt, rondleiding Experience Center
download stukken voor de ALV
link naar statutenwijziging
link naar verslag kascommissie
14:00 Wat doet Quooker met vacuüm? Anthony Kok (Quooker)
14:40 Vacuüm-trends voor EUV-systemen Ton van de Kerkhof (ASML)
15:20 Koffie & thee
15:50 Presentatie over Einstein Telescope Henk Jan Bulten (Nikhef)
16:30 Sluiting door voorzitter Sense Jan van der Molen
16:30 Borrel / Rondleiding door Experience Center
18:00 Einde
Wij hopen u te zien op 12 mei 2023, bij ASML.
Adres, openbaar vervoer en parkeren:
ASML Veldhoven
Twinscan Auditorium gebouw 7
De Run 6665
5504 DT Veldhoven
Kaart van de omgeving van ASML
Openbaar vervoer:
Vanaf station Eindhoven Centraal kunt u met bus 319, 19 en 18 naar de ASML Campus. De bushalte waar u de bus uitstapt heet ASML - Gebouw 4. De bushalte is naast gebouw 4. Vanaf daar volgt u de borden "NEVAC dag" naar Receptie Gebouw 7. "
Parkeren: volg de borden “Parking P1”; voor bedrijven met bedrijvenstandmateriaal: volg “P1 Visitors” (iets minder trappen), de overige bezoekers kunnen op alle dekken parkeren. (mocht P1 toch helemaal vol staan, dan kunnen de bezoekers nog doorrijden naar P3).
1
Programma NEVAC-dag 2022: 60 jaar NEVAC
13 april 2022Rijksmuseum Boerhaave, Lange Sint Agnietenstraat 10, 2312 WC Leiden
Dagprogramma
9.00 Opbouw stands bedrijvenmarkt
9.45 Ontvangst en koffie
10.15 Introductie door Sense Jan van der Molen, voorzitter NEVAC
10.30 Abel Streefland (TU Delft), Jaap Kistemaker en uraniumverrijking in Nederland
11.10 Gesa Welker (TU Delft) Vacuüm op de koudste plekken ter wereld
11.50 NEVAC prijswinnaar 2022: Jesse Koenders (DIFFER) Actief schild tegen de hitte van een fusiereactor
12.20 Lunch en rondleiding door Rijksmuseum Boerhaave (aanwezigen kunnen het museum de hele dag ook zelfstandig bezoeken)
12.30 NEVAC-ALV en bedrijvenmarkt
14.00 Freek Molkenboer (TNO) CSI, de nieuwe Space kalibratiefaciliteit bij TNO
14.40 Johannes Jobst (DEMCON Advanced Mechatronics B.V) SMART: accelerator-based, high-volume production of medical isotopes
15.20 Demonstraties door bedrijven van hun producten
16.00 Borrel en rondleiding door Rijksmuseum Boerhaave
17.15 Buffet (voor degenen die zich hiervoor tijdig hebben aangemeld en na betaling)
Avondprogramma
18.45 Spetterende wetenschapsshow door Stichting Rino en inloop breder publiek
19.30 Avondlezing: Joost Frenken (ARCNL, VU en UvA): Veel druk(te) om niets
Link naar deze publiekslezing
Kosten deelname
NEVAC lid gratis
NEVAC-bedrijfslid gratis
Niet-NEVAC-lid € 20 inclusief lidmaatschap
Niet-NEVAC-lid, B.Sc./M.Sc. student € 5 inclusief lidmaatschap
Stand NEVAC-bedrijfsleden € 350
Andere standhouders € 500 inclusief bedrijfslidmaatschap
Dinerbuffet € 27,50
Organisatie
Guido Stam, Sense Jan van der Molen, Gertjan van Baarle en Fred Schenkel
Informatie: Guido Stam, WGstam@Physics.LeidenUniv.nl
Informatie standhouders: Pieter Heidema, pieter.heidema@vacuubrand.com
Download de pdf van NEVAC blad 2022-1 met daarin het complete programma en samenvattingen van de lezingen
NEVAC Symposium 2021, ARCNL, online
It gives us great pride to announce that this year, ARCNL will organize the NEVAC Symposium on May 18, 2021 fully online. Please, check out arcnl.nl/nevac for this year’s program and for your registration for attending the NEVAC Symposium 2021. We hope to welcome all of you for that great day. In addition to a number of exciting lectures, we offer an online tour of ARCNL and two sessions with so-called bullet presentations, as an alternative for the traditional poster session.
Bullet presentations are compact, 3-minute presentations, without questions and answers. You can submit your title and abstract by filling out that information on the registration form. The deadline for these special presentations is Friday, 23 April. We will get in touch with you soon after that to let you know whether your contribution was selected, after which we will provide you with instructions for the pre-recording of these mini-presentations.
This year’s organizers:
Prof. Joost Frenken, Dr. Jan Verhoeven, Dr. Roland Bliem
This year, the Symposium will not be combined with the annual General Assembly of the Members of the NEVAC Society. This meeting will take place online Wednesday 12 May, 19.30 hr. Register for the General Assembly on this page.
Registration
Participation in this year’s NEVAC Symposium is free of charge, even if you’re not a NEVAC member yet (membership registration page). In order to get a ZOOM link to our meeting, you first have to register at arcnl.nl/nevac.
download flyer
Postponed: NEVAC day 2020, ARCNL Amsterdam
Postponed due to COVID-19More information will follow
The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.
Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem
Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam
Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)
10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture
11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session
13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?
13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation
15.00 Tea break
15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale
16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END
Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.
More information will follow