Agenda
After much deliberation in the wake of rapidly changing and unprecedented circumstances surrounding the 2019 Novel Coronavirus (COVID-19), the AVS has made the extremely difficult decision to cancel the AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020) scheduled for June 28-July 1, 2020 in Ghent, Belgium.
BSBF 2020 is a business oriented congress which congregates all the European Research Infrastructures, focused on technology and with the aim to be the main meeting point between Research Infrastructures and industry.BSBF2020 will bring together, for the second time, the largest and most cutting edge research infrastructures in Europe and the world: CERN, EMBL, ESA, ESO, ESRF, ESS, European XFEL, F4E, ILL and SKA as well as other guest and affiliated research organisations.
The forum will offer your business the chance to:
- Learn about business opportunities in the coming years, within a wide range of business areas and technologies
- Meet representatives from Europe's Big Science organisations and their key suppliers.
- Network and establish long lasting partnerships via business-to-business meetings (B2B), business-to-customer meetings (B2C) and in the open exhibition area.
- Get insight into procurement rules, IPR, technology transfer and how businesses can interplay with the Big Science market.
- Boost your SME visibility in the Big Science Market
- Expand your business exploring new technology transfer opportunities
Colorado Convention Center, Denver, COContact: Yvonne Towse, e-mail:yvonne@avs.org
The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.
Het symposium in Congrescentrum ‘s-Hertogenbosch heeft een middagvullend programma met parallelle sessies. Daarnaast is er de mogelijkheid tot het deelnemen aan of bezoeken van de vakbeurs. Het programma wordt in april bekend gemaakt. Vanaf dat moment kan je je inschrijven als symposiumdeelnemer.
Please reserve the date!The aim of this national event is to bring researchers, technologists and other people interested in ALD together to learn about the latest developments in research, development and manufacturing.
The day will feature presentations and also provide ample opportunity for networking.
Please preregister to receive updates on the event: www.AtomicLimits.com/ALD-NL-day
Postponed: NEVAC day 2020, ARCNL Amsterdam
Postponed due to COVID-19More information will follow
The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.
Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem
Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam
Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)
10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture
11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session
13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?
13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation
15.00 Tea break
15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale
16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END
Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.
More information will follow
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