Agenda
The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2021 Workshop (ALE 2021), so that attendees can interact freely. The conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the JW Marriott Tampa Water Street in Tampa, Florida.
More information: www.vacuumnanoelectronics.org/
High Tech Campus EindhovenSuppliers are increasingly being asked to deliver clean products to OEM companies (Original Equipment Manufacturer). Because there is a need for a definition of how clean the product must be, VCCN set up the Nano, Micro, Product Cleanliness project group in 2017. This working group consists of OEM companies, suppliers and knowledge companies. Soon after the working group started, there was a need to develop a guideline so that everyone speaks the same language with regard to product cleanliness. With the help of OEM companies, who set requirements for the cleanliness of the product, they are energetically working on drawing up VCCN Guideline 12.
In this mini-symposium, experts present the progress of VCCN Guideline 12 and provide substantive contributions. The speakers will be:
Koos Agricola, project manager VCCN Guideline 12
Philip van Beek, Contamination Q&A, VCCN
Max van de Berg, Festo
Rients de Groot, Thermo Fisher Scientific
Paul Krüsemann, Eurofins Material Science Netherlands B.V.
Freek Molkenboer, TNO
Olof Teulings, NTS Mechatronics
Dirk Trienekens, ASML Netherlands B.V.
The chairman of the day is Philip van Beek, co-initiator of the Nano, Micro, Product Cleanliness project group.
The 10th Vacuum and Surface Sciences Conference of Asia and Australia (VASSCAA-10) joint with the Chinese Vacuum Conference 2021 (CVS 2021) will be hosted by the Chinese Vacuum Society (CVS) from 11 to 14 October 2021 in Shanghai, China.
The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.
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NEVAC Symposium 2021, ARCNL, online
It gives us great pride to announce that this year, ARCNL will organize the NEVAC Symposium on May 18, 2021 fully online. Please, check out arcnl.nl/nevac for this year’s program and for your registration for attending the NEVAC Symposium 2021. We hope to welcome all of you for that great day. In addition to a number of exciting lectures, we offer an online tour of ARCNL and two sessions with so-called bullet presentations, as an alternative for the traditional poster session.
Bullet presentations are compact, 3-minute presentations, without questions and answers. You can submit your title and abstract by filling out that information on the registration form. The deadline for these special presentations is Friday, 23 April. We will get in touch with you soon after that to let you know whether your contribution was selected, after which we will provide you with instructions for the pre-recording of these mini-presentations.
This year’s organizers:
Prof. Joost Frenken, Dr. Jan Verhoeven, Dr. Roland Bliem
This year, the Symposium will not be combined with the annual General Assembly of the Members of the NEVAC Society. This meeting will take place online Wednesday 12 May, 19.30 hr. Register for the General Assembly on this page.
Registration
Participation in this year’s NEVAC Symposium is free of charge, even if you’re not a NEVAC member yet (membership registration page). In order to get a ZOOM link to our meeting, you first have to register at arcnl.nl/nevac.
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Postponed: NEVAC day 2020, ARCNL Amsterdam
Postponed due to COVID-19More information will follow
The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.
Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem
Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam
Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)
10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture
11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session
13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?
13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation
15.00 Tea break
15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale
16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END
Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.
More information will follow
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