Agenda
Surfaces play an important role in almost all aspects of our lives. Understanding and controlling surfaces and surface interactions can be critical to the success of many biomaterials including biosensors, bioimplants, and drug delivery constructs. It is critical to know as much as possible about a surface in order to both understand the interactions that occur and to be able to design surfaces that promote successful interactions. X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) are two powerful surface analytical methods that have been proven to provide valuable, quantitative and spatial (mapping) information about both biomaterial surfaces as well as biological surfaces/interfaces. In order to maximize the information gained from these methods, it is important to not only understand how the tools work, but also how to properly handle and prepare samples and how to optimize an experimental plan. Register by December 4, 2020
High Tech Campus EindhovenSuppliers are increasingly being asked to deliver clean products to OEM companies (Original Equipment Manufacturer). Because there is a need for a definition of how clean the product must be, VCCN set up the Nano, Micro, Product Cleanliness project group in 2017. This working group consists of OEM companies, suppliers and knowledge companies. Soon after the working group started, there was a need to develop a guideline so that everyone speaks the same language with regard to product cleanliness. With the help of OEM companies, who set requirements for the cleanliness of the product, they are energetically working on drawing up VCCN Guideline 12.
In this mini-symposium, experts present the progress of VCCN Guideline 12 and provide substantive contributions. The speakers will be:
Koos Agricola, project manager VCCN Guideline 12
Philip van Beek, Contamination Q&A, VCCN
Max van de Berg, Festo
Rients de Groot, Thermo Fisher Scientific
Paul Krüsemann, Eurofins Material Science Netherlands B.V.
Freek Molkenboer, TNO
Olof Teulings, NTS Mechatronics
Dirk Trienekens, ASML Netherlands B.V.
The chairman of the day is Philip van Beek, co-initiator of the Nano, Micro, Product Cleanliness project group.
1:00pm - 5:00 pm EDTInstructor: Erwin Kessels
TU DelftFYSICA is the annual physics conference of the Netherlands' Physical Society (NNV). We will celebrate 100 years of NNV. Block this date in your calendar!
Marseille, FranceEVC is an international conference held every 3 years in Europe (every 2 years before 2018) which aims at gathering researchers from University, Industry and Technical Centers to present and discuss the current state of progress in the field of vacuum sciences and technologies.
EVC is organized by the French Vacuum Society (SFV) and Aix Marseille University (AMU), with the endorsement of ITER, located nearby Marseille.
This five-day event will bring together leading experts in Vacuum Sciences and Technologies (chemistry, physics, mechanics, biology, interface durability...) and other professionals for exchanges through lectures and posters.
The IUVSTA-Elsevier Awards are designed to give partial financial support to four postgraduate research students within seven years of obtaining their first degree at the start of the congress to help them to attend EVC-16 conference at which they are presenting a paper.
We are looking forward to welcoming you in Marseille for EVC-16 at 2021. Please save the date!
meer agenda
Postponed: NEVAC day 2020, ARCNL Amsterdam
Postponed due to COVID-19More information will follow
The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.
Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem
Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam
Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)
10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture
11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session
13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?
13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation
15.00 Tea break
15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale
16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END
Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.
More information will follow
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