Agenda
We want to cordially invite you to participate in the RSD 2021 in Leipzig, Germany. It is organized by the Leibniz Institute of Surface Engineering (IOM), which is devoted to research tailoring surface properties, including thin film coatings, using plasmas, ions, electrons, and photons.RSD 2021 is a sequel to a series of successful conferences dedicated to reactive sputter deposition, which were organized starting from 2000 in different countries by different organizations. The main focus is the use of various magnetron sputtering techniques, but RSD 2021 is also open to other sputter deposition processes, such as, for instance, ion beam sputter deposition. Both fundamental aspects and various fields of application are addressed. The conference is steadily growing and brings together young and senior scientists from universities, research institutes, and industry. It is designed to be a place of lively discussions of current and future scientific and technical results or challenges. Therefore, we will do our best to make the RSD 2021 a successful event benefiting all participants and exhibitors.
Location: Virtual/OnlineWebsite
Area-selective deposition (ASD) is a technology that is currently gathering momentum as enabler for bottom-up fabrication. Its main promise is the ability to process material in a self-aligned fashion, thereby eliminating alignment errors in semiconductor processing. In addition, ASD has been considered for alternative nanofabrication schemes in catalysis. By using mature thin film techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) as a starting point, the development of strategies and approaches to ASD primarily focuses on making the growth selective to specific materials or surfaces. This often involves the selective adsorption of reactant species, or as a more general approach, the deactivation of surfaces on which no growth is desired by selective functionalization. While achieving selective deposition is already difficult, maintaining the selectivity is yet another challenge, as there are numerous side-reactions that could lead to loss of selectivity. In this webinar, several aspects of ASD technology will be addressed, ranging from fundamental surface reactions to technological challenges.
Physics@Veldhoven takes place each year in January. It is a large congress that provides a topical overview of physics in the Netherlands. Traditionally, young researchers are given the chance to present themselves and their work alongside renowned names from the Dutch and international physics community. The programme covers Statistical physics & soft condensed matter, Physics of fluids, Plasma & fusion physics, Quantum physics, Nanoscale hysics, Atomic, molecular and optical physics, Materials physics, Particle physics, Astroparticle physics and Physics for technology.
Location: Virtual/OnlineWebsite
Understanding the origin of stress in thin films produced by physical vapor deposition (PVD) is of key importance as excessive stress levels can lead to premature failure by cracking, buckling or interfacial delamination, which compromises device durability.
This webinar will provide an overview on how film stress develops during deposition, how it is affected by the main process parameters, and how to mitigate it. Selected examples from epitaxial, amorphous and polycrystalline thin films will be highlighted, with emphasis on metallic thin films. Models explaining the generation and relaxation of stress will be presented and discussed. The webinar will also cover practical aspects on how to measure stress during growth using wafer curvature methods.
An experts view on cleanlinessThe cleaning of components is one of the critical steps in modern production processes. Whether it comes to ensuring the required cleanliness for subsequent steps in the process, or guaranteeing the quality and functionality of the component to be cleaned, the cleaning of components is a crucial step in many industries, such as metal working and processing, automotive, medical technology, and aerospace.
Website
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NEVAC Symposium 2021, ARCNL, online
It gives us great pride to announce that this year, ARCNL will organize the NEVAC Symposium on May 18, 2021 fully online. Please, check out arcnl.nl/nevac for this year’s program and for your registration for attending the NEVAC Symposium 2021. We hope to welcome all of you for that great day. In addition to a number of exciting lectures, we offer an online tour of ARCNL and two sessions with so-called bullet presentations, as an alternative for the traditional poster session.
Bullet presentations are compact, 3-minute presentations, without questions and answers. You can submit your title and abstract by filling out that information on the registration form. The deadline for these special presentations is Friday, 23 April. We will get in touch with you soon after that to let you know whether your contribution was selected, after which we will provide you with instructions for the pre-recording of these mini-presentations.
This year’s organizers:
Prof. Joost Frenken, Dr. Jan Verhoeven, Dr. Roland Bliem
This year, the Symposium will not be combined with the annual General Assembly of the Members of the NEVAC Society. This meeting will take place online Wednesday 12 May, 19.30 hr. Register for the General Assembly on this page.
Registration
Participation in this year’s NEVAC Symposium is free of charge, even if you’re not a NEVAC member yet (membership registration page). In order to get a ZOOM link to our meeting, you first have to register at arcnl.nl/nevac.
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Postponed: NEVAC day 2020, ARCNL Amsterdam
Postponed due to COVID-19More information will follow
The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.
Organizers
Prof. Joost Frenken
Dr. Jan Verhoeven
Dr. Roland Bliem
Location
Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
Science Park 125, 1098 XG Amsterdam
ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
Science Park 106, 1098 XG Amsterdam
Program
09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)
10.00 PLENARY SESSION
- Ron Heeren (Maastricht University): Ions, Images and Innovation: How molecular microscopes make medicine more precise
- Rutger Schlatmann (Helmholtz Zentrum, Berlin): Pushing solar energy conversion beyond today´s efficiency and cost limits
- NEVAC-Prize, including lecture
11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session
13.30 PARALLEL SESSION A
- Eric Louis (University of Twente): Recent developments in optics for EUV-lithography
- Gosse de Vries (ASML, Veldhoven): EUV lithography and its vacuum of a kind
- Bart Weber (ARCNL, Amsterdam): Why does friction limit our ability to make smart phones smarter?
13.30 PARALLEL SESSION B
- Diederik Depla (Ghent University): Impurity dominated film growth
- Thomas Lucas (Eindhoven University of Technology & ARCNL): Smart*Light: A Compact Inverse Compton X-ray Source
- Mehdi Saedi (Leiden University): Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation
15.00 Tea break
15.30 PLENARY SESSION
Ulrike Diebold (Vienna University of Technology): Oxide Surfaces at the Atomic Scale
16.15 Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END
Registration
Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 25 is requested.
More information will follow
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