Agenda
We want to cordially invite you to participate in the RSD 2021 in Leipzig, Germany. It is organized by the Leibniz Institute of Surface Engineering (IOM), which is devoted to research tailoring surface properties, including thin film coatings, using plasmas, ions, electrons, and photons.RSD 2021 is a sequel to a series of successful conferences dedicated to reactive sputter deposition, which were organized starting from 2000 in different countries by different organizations. The main focus is the use of various magnetron sputtering techniques, but RSD 2021 is also open to other sputter deposition processes, such as, for instance, ion beam sputter deposition. Both fundamental aspects and various fields of application are addressed. The conference is steadily growing and brings together young and senior scientists from universities, research institutes, and industry. It is designed to be a place of lively discussions of current and future scientific and technical results or challenges. Therefore, we will do our best to make the RSD 2021 a successful event benefiting all participants and exhibitors.
Location: Virtual/OnlineWebsite
Area-selective deposition (ASD) is a technology that is currently gathering momentum as enabler for bottom-up fabrication. Its main promise is the ability to process material in a self-aligned fashion, thereby eliminating alignment errors in semiconductor processing. In addition, ASD has been considered for alternative nanofabrication schemes in catalysis. By using mature thin film techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) as a starting point, the development of strategies and approaches to ASD primarily focuses on making the growth selective to specific materials or surfaces. This often involves the selective adsorption of reactant species, or as a more general approach, the deactivation of surfaces on which no growth is desired by selective functionalization. While achieving selective deposition is already difficult, maintaining the selectivity is yet another challenge, as there are numerous side-reactions that could lead to loss of selectivity. In this webinar, several aspects of ASD technology will be addressed, ranging from fundamental surface reactions to technological challenges.
Physics@Veldhoven takes place each year in January. It is a large congress that provides a topical overview of physics in the Netherlands. Traditionally, young researchers are given the chance to present themselves and their work alongside renowned names from the Dutch and international physics community. The programme covers Statistical physics & soft condensed matter, Physics of fluids, Plasma & fusion physics, Quantum physics, Nanoscale hysics, Atomic, molecular and optical physics, Materials physics, Particle physics, Astroparticle physics and Physics for technology.
Location: Virtual/OnlineWebsite
Understanding the origin of stress in thin films produced by physical vapor deposition (PVD) is of key importance as excessive stress levels can lead to premature failure by cracking, buckling or interfacial delamination, which compromises device durability.
This webinar will provide an overview on how film stress develops during deposition, how it is affected by the main process parameters, and how to mitigate it. Selected examples from epitaxial, amorphous and polycrystalline thin films will be highlighted, with emphasis on metallic thin films. Models explaining the generation and relaxation of stress will be presented and discussed. The webinar will also cover practical aspects on how to measure stress during growth using wafer curvature methods.
An experts view on cleanlinessThe cleaning of components is one of the critical steps in modern production processes. Whether it comes to ensuring the required cleanliness for subsequent steps in the process, or guaranteeing the quality and functionality of the component to be cleaned, the cleaning of components is a crucial step in many industries, such as metal working and processing, automotive, medical technology, and aerospace.
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meer agenda
NEVAC-prijs
Ieder jaar reikt de NEVAC een prijs uit van 1000 euro voor het beste ingezonden artikel voor het NEVAC blad, geschreven door studenten en promovendi. Het artikel moet gaan over eigen onderzoek waarin het gebruik van vacuümtechniek wordt toegelicht. De deadline is ieder jaar op 1 februari. De winnaar mag een lezing geven tijdens de NEVAC-dag. Er wordt één winnaar aangewezen door de jury, maar alle gepubliceerde artikelen van studenten en promovendi worden door de NEVAC beloond met 250 euro.Winnaars NEVAC-prijs
2020: Brian Baker (RU Groningen)
2019: Tahsin Faraz (TU Eindhoven)
2018: Peter Jacobse (Universiteit Utrecht)
2017: Stein van Eden (DIFFER)
2016: Martijn Vos (TU Eindhoven)
2015: Jaap Kautz en Johannes Jobst (Universiteit Leiden)
2014: Ronald van Leeuwen (TU Delft)
2013: Bart Macco (TU Eindhoven) en Marko Sturm (M2i en DIFFER)
2012: Bas Dielissen (TU Eindhoven) en Fred Schenkel (Universiteit Leiden)
2011: Sander Roobol (Universiteit Leiden)
NEVAC-prijs 2022
Studenten en promovendi kunnen in 2022 weer 1000 euro winnen: de NEVAC-prijs voor het beste ingezonden artikel – met een omvang van ongeveer 2000 woorden – over eigen onderzoek waarin het gebruik van vacuümtechniek wordt toegelicht. Stuur het artikel uiterlijk 1 februari 2022 naar redactie@nevac.nl. De winnaar mag een lezing geven tijdens de 60-ste NEVAC-dag op 13 april 2022 in Rijksmuseum Boerhaave in Leiden. Dat is goed voor de outreach van je groep in de richting van de vacuümtechnische gemeenschap in Nederland.
Er wordt één winnaar aangewezen door de jury, maar alle gepubliceerde artikelen van studenten en promovendi worden door de NEVAC beloond met 250 euro. Niet-Nederlandstalige studenten mogen een Engelstalig artikel insturen. Kijk hier voor uitgebreide richtlijnen.
Ken je iemand die het NEVAC blad niet leest en wel een toepasselijk artikel kan schrijven, wijs die persoon dan op de mogelijkheid om deel te nemen.
NEVAC Prize 2022
Each year the Dutch Vacuum Society (NEVAC) awards a prize of 1000 Euro to the student who writes the best article, related to vacuum technology, for the NEVAC blad. The article (around 2000 words), should describe your research and focus on the vacuum technology used. The readers of the magazine are researchers, vacuum technology company members, and technicians. Your assignment is to write an appealing story for this wide audience.
The winner is invited to present the winning paper during the 60th NEVAC-dag in Rijksmuseum Boerhaave in Leiden, 13 April 2022.
Only one winner will be appointed, but NEVAC rewards all published articles, written by students, with 250 Euro.
If Dutch is not your native language, you are allowed to write in English.
The next deadline is 1 Februari 2022. Send your contribution to: redactie@nevac.nl.
Guidelines for the article are published here.