1:00pm - 5:00 pm EDT
Instructor: Erwin Kessels

High Tech Campus Eindhoven

Suppliers are increasingly being asked to deliver clean products to OEM companies (Original Equipment Manufacturer). Because there is a need for a definition of how clean the product must be, VCCN set up the Nano, Micro, Product Cleanliness project group in 2017. This working group consists of OEM companies, suppliers and knowledge companies. Soon after the working group started, there was a need to develop a guideline so that everyone speaks the same language with regard to product cleanliness. With the help of OEM companies, who set requirements for the cleanliness of the product, they are energetically working on drawing up VCCN Guideline 12.

In this mini-symposium, experts present the progress of VCCN Guideline 12 and provide substantive contributions. The speakers will be:

Koos Agricola, project manager VCCN Guideline 12
Philip van Beek, Contamination Q&A, VCCN
Max van de Berg, Festo
Rients de Groot, Thermo Fisher Scientific
Paul Krüsemann, Eurofins Material Science Netherlands B.V.
Freek Molkenboer, TNO
Olof Teulings, NTS Mechatronics
Dirk Trienekens, ASML Netherlands B.V.

The chairman of the day is Philip van Beek, co-initiator of the Nano, Micro, Product Cleanliness project group.

The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2021 Workshop (ALE 2021), so that attendees can interact freely. The conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the JW Marriott Tampa Water Street in Tampa, Florida.