After much deliberation in the wake of rapidly changing and unprecedented circumstances surrounding the 2019 Novel Coronavirus (COVID-19), the AVS has made the extremely difficult decision to cancel the AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020) scheduled for June 28-July 1, 2020 in Ghent, Belgium.

Colorado Convention Center, Denver, CO
Contact: Yvonne Towse, e-mail:yvonne@avs.org

The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

Please reserve the date!
The aim of this national event is to bring researchers, technologists and other people interested in ALD together to learn about the latest developments in research, development and manufacturing.
The day will feature presentations and also provide ample opportunity for networking.
Please preregister to receive updates on the event: www.AtomicLimits.com/ALD-NL-day