The aim of the IUVSTA workshop on Advances in the characterization of surface engineering structures, coatings, and thin films is to address significant advances in characterization techniques for nanostructure, composition and properties of surface engineering structures, coatings and thin films within the past decade. Invited talks given by well recognized experts will cover mainly, but not only, (synchrotron) X-ray diffraction based techniques, scanning and transmission electron microscopy, atom probe tomography, micro-mechanical testing and in-situ/in-operando and temperature variable setups. The necessity to use a combination of advanced characterization techniques to fully understand composition-structure-properties relationships will be highlighted.

Oregon Convention Center, Portland OR, United States
The AVS International Symposium and Exhibition has been developed to address cutting-edge issues associated with vacuum science and technology in both the research and manufacturing communities. The Symposium is a week long forum for science and technology exchange featuring papers from technical divisions and technology groups, and topical conferences on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 3,000 scientists and engineers gather from around the world to attend. Short courses are offered in conjunction with the International Symposium providing specialized training in specific areas of vacuum science and related technologies. A Career Workshop and Job Center are also offered to all attendees. The Workshop covers such topics as résumé preparation, job search skills, networking, interviewing skills, and more. The Job Center provides the opportunity for job seekers to submit their résumés and meet with potential employers.

Helsinki, Finland
The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2024 Workshop (ALE 2024), so that attendees can interact freely.