Agenda
We want to cordially invite you to participate in the RSD 2021 in Leipzig, Germany. It is organized by the Leibniz Institute of Surface Engineering (IOM), which is devoted to research tailoring surface properties, including thin film coatings, using plasmas, ions, electrons, and photons.RSD 2021 is a sequel to a series of successful conferences dedicated to reactive sputter deposition, which were organized starting from 2000 in different countries by different organizations. The main focus is the use of various magnetron sputtering techniques, but RSD 2021 is also open to other sputter deposition processes, such as, for instance, ion beam sputter deposition. Both fundamental aspects and various fields of application are addressed. The conference is steadily growing and brings together young and senior scientists from universities, research institutes, and industry. It is designed to be a place of lively discussions of current and future scientific and technical results or challenges. Therefore, we will do our best to make the RSD 2021 a successful event benefiting all participants and exhibitors.
Location: Virtual/OnlineWebsite
Area-selective deposition (ASD) is a technology that is currently gathering momentum as enabler for bottom-up fabrication. Its main promise is the ability to process material in a self-aligned fashion, thereby eliminating alignment errors in semiconductor processing. In addition, ASD has been considered for alternative nanofabrication schemes in catalysis. By using mature thin film techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) as a starting point, the development of strategies and approaches to ASD primarily focuses on making the growth selective to specific materials or surfaces. This often involves the selective adsorption of reactant species, or as a more general approach, the deactivation of surfaces on which no growth is desired by selective functionalization. While achieving selective deposition is already difficult, maintaining the selectivity is yet another challenge, as there are numerous side-reactions that could lead to loss of selectivity. In this webinar, several aspects of ASD technology will be addressed, ranging from fundamental surface reactions to technological challenges.
Physics@Veldhoven takes place each year in January. It is a large congress that provides a topical overview of physics in the Netherlands. Traditionally, young researchers are given the chance to present themselves and their work alongside renowned names from the Dutch and international physics community. The programme covers Statistical physics & soft condensed matter, Physics of fluids, Plasma & fusion physics, Quantum physics, Nanoscale hysics, Atomic, molecular and optical physics, Materials physics, Particle physics, Astroparticle physics and Physics for technology.
Location: Virtual/OnlineWebsite
Understanding the origin of stress in thin films produced by physical vapor deposition (PVD) is of key importance as excessive stress levels can lead to premature failure by cracking, buckling or interfacial delamination, which compromises device durability.
This webinar will provide an overview on how film stress develops during deposition, how it is affected by the main process parameters, and how to mitigate it. Selected examples from epitaxial, amorphous and polycrystalline thin films will be highlighted, with emphasis on metallic thin films. Models explaining the generation and relaxation of stress will be presented and discussed. The webinar will also cover practical aspects on how to measure stress during growth using wafer curvature methods.
An experts view on cleanlinessThe cleaning of components is one of the critical steps in modern production processes. Whether it comes to ensuring the required cleanliness for subsequent steps in the process, or guaranteeing the quality and functionality of the component to be cleaned, the cleaning of components is a crucial step in many industries, such as metal working and processing, automotive, medical technology, and aerospace.
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Vacuümtechniek
"Revival" van het in 1989 door de Nederlandse Vacuümvereniging NEVAC uitgegeven boek Vacuümtechniek (VT), in eerste instantie bedoeld om technici op MBO-niveau op te leiden voor het ontwikkelen van vacuümsystemen, het toepassen van technieken in vacuüm en het oplossen van problemen met vacuümapparatuur. Een boek met alle noodzakelijke informatie voor vacuümtechnici, maar zonder de door het middenkader als "ballast" ervaren verdiepingsstof, die het eveneens in een nieuwe editie verschenen Basisboek Vacuümtechniek voor HBO-ers en academici zo gewild maakt. Het behoeft geen betoog, dat 29 jaar na het verschijnen van de eerste editie het nieuwe VT op vrijwel alle onderdelen intensief is geactualiseerd. Met name de hoofdstukken handelend over vacuümpompen en pompsystemen, drukmeting, restgasanalyse, dichtheidscontrole en reiniging en werkdiscipline zijn sterk uitgebreid en qua opzet onherkenbaar veranderd. Verder is een aantal hoofdstukken voorzien van oefenvraagstukken, onderverdeeld in drie moeilijkheidsgraden. Achterin het boek zijn niet alleen de korte antwoorden bij deze oefeningen opgenomen, maar ook hun complete uitwerkingen. Verder is ten behoeve van het VMBO-niveau een module 'Rekenen en aflezen' toegevoegd. Tenslotte is het boek omwille van diens praktische bruikbaarheid uitgebreid met enige appendices voorzien van relevante overzichten, grafieken en tabellen. Een en ander maakt het nieuwe VT zeer geschikt als cursusboek voor de in Nederland ingeburgerde combi-cursussen MBO-VMBO onder auspiciën van de NEVAC.
Vacuümtechniek is een uitgave onder auspiciën van de NEVAC, die hiermee passende inhoud geeft aan een van haar belangrijke doelstellingen, namelijk de verbreiding van kennis op het vakgebied der vacuümtechniek.
Terug naar overzicht boeken vacuümtechniek